GMR versus interfacial roughness induced from different buffers in (Co/Cu) ML
Identifieur interne : 000176 ( Maroc/Analysis ); précédent : 000175; suivant : 000177GMR versus interfacial roughness induced from different buffers in (Co/Cu) ML
Auteurs : M. El Harfaoui [France] ; H. Le Gall [France] ; J. Ben Youssef [France] ; S. Pogossian [France] ; A. Thiaville [France] ; P. Gogol [France] ; A. Qachaou [Maroc] ; J. M. Desvignes [France]Source :
- Journal of magnetism and magnetic materials [ 0304-8853 ] ; 1999.
Descripteurs français
- Pascal (Inist)
- Wicri :
English descriptors
- KwdEn :
Abstract
The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/Ms)2 presents a strong deviation from a standard linear dependence. Such a deviation is attributed to the presence of Co granules in the Cu or/ and the buffer matrices when strong interface disorder is induced in the samples.
Affiliations:
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<term>Experimental study</term>
<term>Giant magnetoresistance</term>
<term>Interface structure</term>
<term>Magnetization</term>
<term>Multilayers</term>
<term>Property structure relationship</term>
<term>Roughness</term>
<term>Size effect</term>
<term>Tantalum</term>
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<term>Magnétorésistance géante</term>
<term>Multicouche</term>
<term>Couche tampon</term>
<term>Relation structure propriété</term>
<term>Structure interface</term>
<term>Rugosité</term>
<term>Aimantation</term>
<term>Effet dimensionnel</term>
<term>Cobalt</term>
<term>Cuivre</term>
<term>Aluminium</term>
<term>Tantale</term>
<term>Chrome</term>
<term>Co</term>
<term>Cu</term>
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<term>Ta</term>
<term>7570P</term>
<term>Cr</term>
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<term>Aluminium</term>
<term>Tantale</term>
<term>Chrome</term>
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<front><div type="abstract" xml:lang="en">The correlation between the giant magnetoresistance AR/R, at the first maximum of the oscillating thickness dependence of the magnetoresistance (MR), and the structural and magnetic parameters has been investigated in (Co/Cu) multilayers (ML) deposited by the unusual RF sputtering method. Different textures and interface roughnesses have been induced from magnetic (Fe, Co) and non-magnetic (Cu, Al, Ta, Cr) buffers. The MR is independent of the ML texture and grain size but presents a strong correlation with the interface as deduced from small and large angle XRD and AFM. In high roughness ML the evolution, under increasing applied field, of AR/R versus (M/M<sub>s</sub>
)<sup>2</sup>
presents a strong deviation from a standard linear dependence. Such a deviation is attributed to the presence of Co granules in the Cu or/ and the buffer matrices when strong interface disorder is induced in the samples.</div>
</front>
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